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Nanopatterning, Production and Applications based on Nanoimprinting Lithography

Objectif

The NaPANIL project aims to develop processes, materials and tools, both for manufacturing and for control, for truly 3-dimensional nanosurfaces with feature dimensions ranging from 50 nm to several m. The nanosurfaces will be realised using various variants of nanoimprinting lithography. The dedicated application is to control light at nanostructured surfaces and a few potential high impact products have been identified by the end-user partners in the consortium. Design, demonstration and prototyping these applications will act as test-bench for the new manufacturing paradigm. The manufacturing processes possess generic aspects for production of any kind of topographically 3-dimensional nanostructured surfaces. In the R&D of nanoimprinting Europe has a leading position. The NaPANIL consortium combines the best expertise and know how in field to reach the goals in the project.

Champ scientifique (EuroSciVoc)

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Appel à propositions

FP7-NMP-2007-LARGE-1
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Coordinateur

TEKNOLOGIAN TUTKIMUSKESKUS VTT
Contribution de l’UE
€ 1 879 353,25
Coût total
Aucune donnée

Participants (18)